Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale
Identifieur interne : 002B73 ( Main/Exploration ); précédent : 002B72; suivant : 002B74Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale
Auteurs : Abdel-Aziz El Mel [Belgique] ; Marie Buffière [Belgique] ; Pierre-Yves Tessier [France] ; Stephanos Konstantinidis [Belgique] ; Wei Xu [États-Unis] ; Ke Du [États-Unis] ; Ishan Wathuthanthri [États-Unis] ; Chang-Hwan Choi [États-Unis] ; Carla Bittencourt [Belgique] ; Rony Snyders [Belgique]Source :
- Small [ 1613-6810 ] ; 2013-09-09.
Descripteurs français
- Wicri :
- topic : Oxyde.
English descriptors
- KwdEn :
- Acta mater, Annealing, Annealing time, Aspect ratio, Bulk diffusion, Choi, Columnar morphology, Complete oxidation, Copper ions, Copper nanowires, Copper oxide nanotubes, Critical temperature, Deep reactive, Different shapes, Fundamental mechanisms, Grain boundaries, Granular morphology, Hollow nanostructures, Hollow oxide, Hollow oxide nanostructures, Hollowing process, Kirkendall, Kirkendall effect, Laser interference lithography, Magnetron, Mater, Metal nanowires, Model system, Morphology, Nano lett, Nanodots, Nanograting structures, Nanopatterned silicon substrate, Nanoscale kirkendall effect, Nanostructures, Nanotube, Nanotube arrays, Nanowire, Nanowires, Oxidation process, Oxide, Oxide nanotubes, Oxide shell, Oxygen atoms, Oxygen ions, Oxygen species, Silicon, Silicon substrate, Surface diffusion, Surface energy, Thermal annealing, Thermal oxidation, Thermal oxidation time, Total diameter, Transmission electron microscopy, Verlag gmbh, Weak adhesion, Wire axis.
- Teeft :
- Acta mater, Annealing, Annealing time, Aspect ratio, Bulk diffusion, Choi, Columnar morphology, Complete oxidation, Copper ions, Copper nanowires, Copper oxide nanotubes, Critical temperature, Deep reactive, Different shapes, Fundamental mechanisms, Grain boundaries, Granular morphology, Hollow nanostructures, Hollow oxide, Hollow oxide nanostructures, Hollowing process, Kirkendall, Kirkendall effect, Laser interference lithography, Magnetron, Mater, Metal nanowires, Model system, Morphology, Nano lett, Nanodots, Nanograting structures, Nanopatterned silicon substrate, Nanoscale kirkendall effect, Nanostructures, Nanotube, Nanotube arrays, Nanowire, Nanowires, Oxidation process, Oxide, Oxide nanotubes, Oxide shell, Oxygen atoms, Oxygen ions, Oxygen species, Silicon, Silicon substrate, Surface diffusion, Surface energy, Thermal annealing, Thermal oxidation, Thermal oxidation time, Total diameter, Transmission electron microscopy, Verlag gmbh, Weak adhesion, Wire axis.
Abstract
Highly ordered ultra‐long oxide nanotubes are fabricated by a simple two‐step strategy involving the growth of copper nanowires on nanopatterned template substrates by magnetron sputtering, followed by thermal annealing in air. The formation of such tubular nanostructures is explained according to the nanoscale Kirkendall effect. The concept of this new fabrication route is also extendable to create periodic zero‐dimensional hollow nanostructures.
Url:
DOI: 10.1002/smll.201202824
Affiliations:
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<record><TEI wicri:istexFullTextTei="biblStruct"><teiHeader><fileDesc><titleStmt><title xml:lang="en">Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale</title><author><name sortKey="El Mel, Abdel Ziz" sort="El Mel, Abdel Ziz" uniqKey="El Mel A" first="Abdel-Aziz" last="El Mel">Abdel-Aziz El Mel</name></author><author><name sortKey="Buffiere, Marie" sort="Buffiere, Marie" uniqKey="Buffiere M" first="Marie" last="Buffière">Marie Buffière</name></author><author><name sortKey="Tessier, Pierre Ves" sort="Tessier, Pierre Ves" uniqKey="Tessier P" first="Pierre-Yves" last="Tessier">Pierre-Yves Tessier</name></author><author><name sortKey="Konstantinidis, Stephanos" sort="Konstantinidis, Stephanos" uniqKey="Konstantinidis S" first="Stephanos" last="Konstantinidis">Stephanos Konstantinidis</name></author><author><name sortKey="Xu, Wei" sort="Xu, Wei" uniqKey="Xu W" first="Wei" last="Xu">Wei Xu</name></author><author><name sortKey="Du, Ke" sort="Du, Ke" uniqKey="Du K" first="Ke" last="Du">Ke Du</name></author><author><name sortKey="Wathuthanthri, Ishan" sort="Wathuthanthri, Ishan" uniqKey="Wathuthanthri I" first="Ishan" last="Wathuthanthri">Ishan Wathuthanthri</name></author><author><name sortKey="Choi, Chang Wan" sort="Choi, Chang Wan" uniqKey="Choi C" first="Chang-Hwan" last="Choi">Chang-Hwan Choi</name></author><author><name sortKey="Bittencourt, Carla" sort="Bittencourt, Carla" uniqKey="Bittencourt C" first="Carla" last="Bittencourt">Carla Bittencourt</name></author><author><name sortKey="Snyders, Rony" sort="Snyders, Rony" uniqKey="Snyders R" first="Rony" last="Snyders">Rony Snyders</name></author></titleStmt><publicationStmt><idno type="wicri:source">ISTEX</idno><idno type="RBID">ISTEX:20836D62039F8A871DADA8350F6D89DCD4B7857B</idno><date when="2013" year="2013">2013</date><idno type="doi">10.1002/smll.201202824</idno><idno type="url">https://api.istex.fr/document/20836D62039F8A871DADA8350F6D89DCD4B7857B/fulltext/pdf</idno><idno type="wicri:Area/Istex/Corpus">001016</idno><idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Corpus" wicri:corpus="ISTEX">001016</idno><idno type="wicri:Area/Istex/Curation">001016</idno><idno type="wicri:Area/Istex/Checkpoint">000726</idno><idno type="wicri:explorRef" wicri:stream="Istex" wicri:step="Checkpoint">000726</idno><idno type="wicri:doubleKey">1613-6810:2013:El Mel A:highly:ordered:hollow</idno><idno type="wicri:Area/Main/Merge">002B85</idno><idno type="wicri:Area/Main/Curation">002B73</idno><idno type="wicri:Area/Main/Exploration">002B73</idno></publicationStmt><sourceDesc><biblStruct><analytic><title level="a" type="main" xml:lang="en">Highly Ordered Hollow Oxide Nanostructures: The Kirkendall Effect at the Nanoscale</title><author><name sortKey="El Mel, Abdel Ziz" sort="El Mel, Abdel Ziz" uniqKey="El Mel A" first="Abdel-Aziz" last="El Mel">Abdel-Aziz El Mel</name><affiliation wicri:level="1"><country xml:lang="fr">Belgique</country><wicri:regionArea>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons</wicri:regionArea><wicri:noRegion>B‐7000 Mons</wicri:noRegion></affiliation><affiliation></affiliation><affiliation wicri:level="1"><country xml:lang="fr">Belgique</country><wicri:regionArea>Correspondence address: Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons</wicri:regionArea><wicri:noRegion>B‐7000 Mons</wicri:noRegion></affiliation></author><author><name sortKey="Buffiere, Marie" sort="Buffiere, Marie" uniqKey="Buffiere M" first="Marie" last="Buffière">Marie Buffière</name><affiliation wicri:level="1"><country xml:lang="fr">Belgique</country><wicri:regionArea>Department of Electrical Engineering, KU Leuven, KastteelparkArenberg 10, B‐3001 Heverlee</wicri:regionArea><wicri:noRegion>B‐3001 Heverlee</wicri:noRegion></affiliation><affiliation wicri:level="1"><country xml:lang="fr">Belgique</country><wicri:regionArea>IMEC Kapeldreef 75, B‐3001 Heverlee</wicri:regionArea><wicri:noRegion>B‐3001 Heverlee</wicri:noRegion></affiliation></author><author><name sortKey="Tessier, Pierre Ves" sort="Tessier, Pierre Ves" uniqKey="Tessier P" first="Pierre-Yves" last="Tessier">Pierre-Yves Tessier</name><affiliation wicri:level="4"><country xml:lang="fr">France</country><wicri:regionArea>Université de Nantes, CNRS, Institut des Matériaux Jean Rouxel, UMR 6502, 2 rue de la, Houssinière B. P. 32229, 44322 Nantes cedex 3</wicri:regionArea><placeName><region type="region" nuts="2">Pays de la Loire</region><settlement type="city">Nantes</settlement><settlement type="city">Nantes</settlement></placeName><orgName type="university">Université de Nantes</orgName></affiliation></author><author><name sortKey="Konstantinidis, Stephanos" sort="Konstantinidis, Stephanos" uniqKey="Konstantinidis S" first="Stephanos" last="Konstantinidis">Stephanos Konstantinidis</name><affiliation wicri:level="1"><country xml:lang="fr">Belgique</country><wicri:regionArea>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons</wicri:regionArea><wicri:noRegion>B‐7000 Mons</wicri:noRegion></affiliation></author><author><name sortKey="Xu, Wei" sort="Xu, Wei" uniqKey="Xu W" first="Wei" last="Xu">Wei Xu</name><affiliation wicri:level="2"><country xml:lang="fr">États-Unis</country><wicri:regionArea>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030</wicri:regionArea><placeName><region type="state">New Jersey</region></placeName></affiliation></author><author><name sortKey="Du, Ke" sort="Du, Ke" uniqKey="Du K" first="Ke" last="Du">Ke Du</name><affiliation wicri:level="2"><country xml:lang="fr">États-Unis</country><wicri:regionArea>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030</wicri:regionArea><placeName><region type="state">New Jersey</region></placeName></affiliation></author><author><name sortKey="Wathuthanthri, Ishan" sort="Wathuthanthri, Ishan" uniqKey="Wathuthanthri I" first="Ishan" last="Wathuthanthri">Ishan Wathuthanthri</name><affiliation wicri:level="2"><country xml:lang="fr">États-Unis</country><wicri:regionArea>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030</wicri:regionArea><placeName><region type="state">New Jersey</region></placeName></affiliation></author><author><name sortKey="Choi, Chang Wan" sort="Choi, Chang Wan" uniqKey="Choi C" first="Chang-Hwan" last="Choi">Chang-Hwan Choi</name><affiliation wicri:level="2"><country xml:lang="fr">États-Unis</country><wicri:regionArea>Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ 07030</wicri:regionArea><placeName><region type="state">New Jersey</region></placeName></affiliation></author><author><name sortKey="Bittencourt, Carla" sort="Bittencourt, Carla" uniqKey="Bittencourt C" first="Carla" last="Bittencourt">Carla Bittencourt</name><affiliation wicri:level="1"><country xml:lang="fr">Belgique</country><wicri:regionArea>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons</wicri:regionArea><wicri:noRegion>B‐7000 Mons</wicri:noRegion></affiliation></author><author><name sortKey="Snyders, Rony" sort="Snyders, Rony" uniqKey="Snyders R" first="Rony" last="Snyders">Rony Snyders</name><affiliation wicri:level="1"><country xml:lang="fr">Belgique</country><wicri:regionArea>Chimie des Interactions Plasma‐Surface (ChIPS), CIRMAP, Research Institute for Materials Science and Engineering, University of Mons, 23 Place du Parc, B‐7000 Mons</wicri:regionArea><wicri:noRegion>B‐7000 Mons</wicri:noRegion></affiliation><affiliation wicri:level="1"><country xml:lang="fr">Belgique</country><wicri:regionArea>Materia Nova Research Center, 1 Avenue Nicolas Copernic, B‐7000 Mons</wicri:regionArea><wicri:noRegion>B‐7000 Mons</wicri:noRegion></affiliation></author></analytic><monogr></monogr><series><title level="j" type="main">Small</title><title level="j" type="alt">SMALL</title><idno type="ISSN">1613-6810</idno><idno type="eISSN">1613-6829</idno><imprint><biblScope unit="vol">9</biblScope><biblScope unit="issue">17</biblScope><biblScope unit="page" from="2838">2838</biblScope><biblScope unit="page" to="2843">2843</biblScope><biblScope unit="page-count">6</biblScope><publisher>WILEY‐VCH Verlag</publisher><pubPlace>Weinheim</pubPlace><date type="published" when="2013-09-09">2013-09-09</date></imprint><idno type="ISSN">1613-6810</idno></series></biblStruct></sourceDesc><seriesStmt><idno type="ISSN">1613-6810</idno></seriesStmt></fileDesc><profileDesc><textClass><keywords scheme="KwdEn" xml:lang="en"><term>Acta mater</term><term>Annealing</term><term>Annealing time</term><term>Aspect ratio</term><term>Bulk diffusion</term><term>Choi</term><term>Columnar morphology</term><term>Complete oxidation</term><term>Copper ions</term><term>Copper nanowires</term><term>Copper oxide nanotubes</term><term>Critical temperature</term><term>Deep reactive</term><term>Different shapes</term><term>Fundamental mechanisms</term><term>Grain boundaries</term><term>Granular morphology</term><term>Hollow nanostructures</term><term>Hollow oxide</term><term>Hollow oxide nanostructures</term><term>Hollowing process</term><term>Kirkendall</term><term>Kirkendall effect</term><term>Laser interference lithography</term><term>Magnetron</term><term>Mater</term><term>Metal nanowires</term><term>Model system</term><term>Morphology</term><term>Nano lett</term><term>Nanodots</term><term>Nanograting structures</term><term>Nanopatterned silicon substrate</term><term>Nanoscale kirkendall effect</term><term>Nanostructures</term><term>Nanotube</term><term>Nanotube arrays</term><term>Nanowire</term><term>Nanowires</term><term>Oxidation process</term><term>Oxide</term><term>Oxide nanotubes</term><term>Oxide shell</term><term>Oxygen atoms</term><term>Oxygen ions</term><term>Oxygen species</term><term>Silicon</term><term>Silicon substrate</term><term>Surface diffusion</term><term>Surface energy</term><term>Thermal annealing</term><term>Thermal oxidation</term><term>Thermal oxidation time</term><term>Total diameter</term><term>Transmission electron microscopy</term><term>Verlag gmbh</term><term>Weak adhesion</term><term>Wire axis</term></keywords><keywords scheme="Teeft" xml:lang="en"><term>Acta mater</term><term>Annealing</term><term>Annealing time</term><term>Aspect ratio</term><term>Bulk diffusion</term><term>Choi</term><term>Columnar morphology</term><term>Complete oxidation</term><term>Copper ions</term><term>Copper nanowires</term><term>Copper oxide nanotubes</term><term>Critical temperature</term><term>Deep reactive</term><term>Different shapes</term><term>Fundamental mechanisms</term><term>Grain boundaries</term><term>Granular morphology</term><term>Hollow nanostructures</term><term>Hollow oxide</term><term>Hollow oxide nanostructures</term><term>Hollowing process</term><term>Kirkendall</term><term>Kirkendall effect</term><term>Laser interference lithography</term><term>Magnetron</term><term>Mater</term><term>Metal nanowires</term><term>Model system</term><term>Morphology</term><term>Nano lett</term><term>Nanodots</term><term>Nanograting structures</term><term>Nanopatterned silicon substrate</term><term>Nanoscale kirkendall effect</term><term>Nanostructures</term><term>Nanotube</term><term>Nanotube arrays</term><term>Nanowire</term><term>Nanowires</term><term>Oxidation process</term><term>Oxide</term><term>Oxide nanotubes</term><term>Oxide shell</term><term>Oxygen atoms</term><term>Oxygen ions</term><term>Oxygen species</term><term>Silicon</term><term>Silicon substrate</term><term>Surface diffusion</term><term>Surface energy</term><term>Thermal annealing</term><term>Thermal oxidation</term><term>Thermal oxidation time</term><term>Total diameter</term><term>Transmission electron microscopy</term><term>Verlag gmbh</term><term>Weak adhesion</term><term>Wire axis</term></keywords><keywords scheme="Wicri" type="topic" xml:lang="fr"><term>Oxyde</term></keywords></textClass></profileDesc></teiHeader><front><div type="abstract">Highly ordered ultra‐long oxide nanotubes are fabricated by a simple two‐step strategy involving the growth of copper nanowires on nanopatterned template substrates by magnetron sputtering, followed by thermal annealing in air. The formation of such tubular nanostructures is explained according to the nanoscale Kirkendall effect. The concept of this new fabrication route is also extendable to create periodic zero‐dimensional hollow nanostructures.</div></front></TEI><affiliations><list><country><li>Belgique</li><li>France</li><li>États-Unis</li></country><region><li>New Jersey</li><li>Pays de la Loire</li></region><settlement><li>Nantes</li></settlement><orgName><li>Université de Nantes</li></orgName></list><tree><country name="Belgique"><noRegion><name sortKey="El Mel, Abdel Ziz" sort="El Mel, Abdel Ziz" uniqKey="El Mel A" first="Abdel-Aziz" last="El Mel">Abdel-Aziz El Mel</name></noRegion><name sortKey="Bittencourt, Carla" sort="Bittencourt, Carla" uniqKey="Bittencourt C" first="Carla" last="Bittencourt">Carla Bittencourt</name><name sortKey="Buffiere, Marie" sort="Buffiere, Marie" uniqKey="Buffiere M" first="Marie" last="Buffière">Marie Buffière</name><name sortKey="Buffiere, Marie" sort="Buffiere, Marie" uniqKey="Buffiere M" first="Marie" last="Buffière">Marie Buffière</name><name sortKey="El Mel, Abdel Ziz" sort="El Mel, Abdel Ziz" uniqKey="El Mel A" first="Abdel-Aziz" last="El Mel">Abdel-Aziz El Mel</name><name sortKey="Konstantinidis, Stephanos" sort="Konstantinidis, Stephanos" uniqKey="Konstantinidis S" first="Stephanos" last="Konstantinidis">Stephanos Konstantinidis</name><name sortKey="Snyders, Rony" sort="Snyders, Rony" uniqKey="Snyders R" first="Rony" last="Snyders">Rony Snyders</name><name sortKey="Snyders, Rony" sort="Snyders, Rony" uniqKey="Snyders R" first="Rony" last="Snyders">Rony Snyders</name></country><country name="France"><region name="Pays de la Loire"><name sortKey="Tessier, Pierre Ves" sort="Tessier, Pierre Ves" uniqKey="Tessier P" first="Pierre-Yves" last="Tessier">Pierre-Yves Tessier</name></region></country><country name="États-Unis"><region name="New Jersey"><name sortKey="Xu, Wei" sort="Xu, Wei" uniqKey="Xu W" first="Wei" last="Xu">Wei Xu</name></region><name sortKey="Choi, Chang Wan" sort="Choi, Chang Wan" uniqKey="Choi C" first="Chang-Hwan" last="Choi">Chang-Hwan Choi</name><name sortKey="Du, Ke" sort="Du, Ke" uniqKey="Du K" first="Ke" last="Du">Ke Du</name><name sortKey="Wathuthanthri, Ishan" sort="Wathuthanthri, Ishan" uniqKey="Wathuthanthri I" first="Ishan" last="Wathuthanthri">Ishan Wathuthanthri</name></country></tree></affiliations></record>Pour manipuler ce document sous Unix (Dilib)
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